As semiconductor scaling has continued, increasingly rigorous requirements for precision and uniformity in chip fabrication have propelled the first comprehensive redesign of the silicon etch chamber in over a decade. The resulting Applied Centris Sym3 system delivers world-class cross-wafer uniformity with unprecedented within-chip feature control in critical etch applications for high-volume manufacturing at the 1x/10nm node and beyond.
Centris Technologies offers specialized knowledge for the development and integration of software solutions related to the 4th Industrial Revolution (Industry 4.0). The services cover an entire project, from needs analysis to the final deployment of control and supervision systems. We develop systems to deliver the right information, at the right time, to the right people to increase productivity and guide investment decisions, with supporting data.
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The redesigned Sym3 chamber environment makes possible process control to within a few atomic layers within chip, chip to chip, and wafer to wafer. The Centris platform delivers the excellent repeatability and high productivity demanded for high-volume manufacturing through system intelligence software that ensures exact process matching among the six etch chambers and between the two plasma clean chambers mounted on the platform.

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